Low-energy ions source of plane geometry on the basis of plasma-beam discharge with a slot cathode
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/1115/i=2/a=022036/pdf
Reference17 articles.
1. Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?
2. Atomic Layer Etching at the Tipping Point: An Overview
3. Parameters of the beam plasma formed by a forevacuum plasma source of a ribbon beam in zero-field transportation system
4. Generation of high-energy electrons in a transverse slot-cathode nanosecond discharge at working gas medium pressures
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dynamics of the Development of Ionization Fronts and the Density Distribution of the Main Plasma Parameters in a Nanosecond Discharge with an Extended Hollow Cathode in Argon;High Temperature;2022-12
2. The dynamics of a nanosecond gas discharge development with an extended slot cathode in argon;Plasma Science and Technology;2020-10-21
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