Trial to control hydrogen content in a-Si:H deposited using rare-gas-diluted silane plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference9 articles.
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2. Control of higher-silane generation by dilution gases in SiH4 plasmas;Plasma Sources Science and Technology;2020-09-01
3. Effect of gas-phase processes in argon-helium-silane plasma on amorphous-nanocrystalline transition in thin films of a-Si:H;Journal of Physics: Conference Series;2019-08-01
4. Calculations of the chemical composition of helium–silane plasma;Russian Physics Journal;2010-06
5. Properties of a-Si:H films deposited from silane diluted with hydrogen and helium using modified pulse plasma technique;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-11
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