Experimental diagnostics of plasma radial uniformity and comparisons with computational simulations in capacitive discharges-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Experimental diagnostics of plasma radial uniformity and comparisons with computational simulations in capacitive discharges

Published:2015-02-13 Issue:2 Volume:24 Page:025013
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Liu Yong-Xin,Liang Ying-Shuang,Wen De-Qi,Bi Zhen-Hua,Wang You-Nian

Funder

Nation Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

China Postdoctoral Science Foundation

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/24/i=2/a=025013/pdf

Reference47 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Dual excitation reactive ion etcher for low energy plasma processing

3. Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices

4. Mode Transition Induced by Low-Frequency Current in Dual-Frequency Capacitive Discharges

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of radio frequency wave driving frequency on capacitively coupled plasma discharge;AIP Advances;2024-06-01

2. Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors;Journal of Vacuum Science & Technology A;2023-07-27

3. On the importance of excited state species in low pressure capacitively coupled plasma argon discharges;Plasma Sources Science and Technology;2023-06-01

4. Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma;Journal of Vacuum Science & Technology A;2023-04-20

5. Effects of a radial variation of surface coefficients on plasma uniformity in capacitive RF discharges;Plasma Sources Science and Technology;2023-04-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3