Plasma characteristics observed through high-aspect-ratio holes in plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference14 articles.
1. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
2. Plasma potentials of 13.56‐MHz rf argon glow discharges in a planar system
3. Measurement of ion energy distributions at the powered rf electrode in a variable magnetic field
4. Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher
5. Bombardment energies of O2+in low pressure reactive ion etching
Cited by 35 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. 50 Years of Reactive Ion Etching in Microelectronics;IEEE Transactions on Materials for Electron Devices;2024
2. Ion energy distribution measurement device using a capillary plate with high-aspect ratio;Physics of Plasmas;2023-12-01
3. Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma;Japanese Journal of Applied Physics;2023-03-10
4. Analysis of formation mechanism of deposited film in a high-aspect-ratio hole during dry etching using fluorocarbon gas plasmas;Applied Physics Express;2022-09-09
5. Reactive Ion Etching;Atomic Layer Processing;2021-04-28
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3