Electrical and plasma parameters of ICP with high coupling efficiency-Reference-Cited by-同舟云学术

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Electrical and plasma parameters of ICP with high coupling efficiency

Published:2011-02-17 Issue:2 Volume:20 Page:025004
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Godyak V A

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference19 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Does high density–low pressure etching depend on the type of plasma source?

3. Nonequilibrium EEDF in gas discharge plasmas

4. Standing wave and skin effects in large-area, high-frequency capacitive discharges

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3. Analysis of Essential Features and Optimal Operational Parameters of an RF-ICP Torch for Waste Treatment Applications;Recycling;2024-02-15

4. Production rates and destruction frequencies of ammonia in inductively coupled H₂O/N₂ and H₂/N₂ plasmas;Contributions to Plasma Physics;2023-12-28

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