Modifying the IEDFs at a plasma boundary in a low-pressure RF discharge using electron beam injection-Reference-Cited by-同舟云学术

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Modifying the IEDFs at a plasma boundary in a low-pressure RF discharge using electron beam injection

Published:2001-11-01 Issue:4 Volume:10 Page:627-635
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Heason D J,Bradley J W

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference38 articles.

1. Ion energy distributions in rf sheaths; review, analysis and simulation

2. Ion energy distributions in pulsed large area microwave plasma

3. Control of ion energy distribution at substrates during plasma processing

4. Critical ion energy and ion flux in the growth of films by plasma‐enhanced chemical‐vapor deposition

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