Plasma diagnostics in negative ion sources-Reference-Cited by-同舟云学术

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Plasma diagnostics in negative ion sources

Published:1993-08-01 Issue:3 Volume:2 Page:190-197
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Bacal M

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference19 articles.

1. Production of a quasi electron free plasma using electronic attachment

2. Measurement of H− density in plasma by photodetachment

3. Negative ion densities in NF3 discharges

Cited by 59 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advancement of Langmuir probe-based laser photo-detachment technique for negative ion density measurement in a high-power helicon plasma source;Review of Scientific Instruments;2024-04-01

2. Schottky effect on the wavelength threshold for the photo-detachment from charged metallic nanoparticles;Journal of Physics D: Applied Physics;2023-05-03

3. New Method to Evaluate Negative-Ion Density Using Conventional Langmuir Probe;Plasma and Fusion Research;2023-04-05

4. Experimental study on dynamic effects of H and D negative ions in an ECR-plasma source;Journal of Physics: Conference Series;2022-04-01

5. Equilibrium properties of inhomogeneous partially-magnetized plasma containing negative ions;Journal of Physics D: Applied Physics;2022-03-09

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