High power extreme ultra-violet (EUV) light sources for future lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

High power extreme ultra-violet (EUV) light sources for future lithography

Published:2006-04-24 Issue:2 Volume:15 Page:S8-S16
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Jonkers Jeroen

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference66 articles.

1. Multilayer coatings for the EUVL process development tool

2. X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92

Cited by 64 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Current Sources of Vacuum Ultraviolet Radiation: State and Prospects (A Review);Plasma Physics Reports;2024-07

2. Electron–phonon interaction toward engineering carrier mobility of periodic edge structured graphene nanoribbons;Scientific Reports;2023-04-08

3. Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests;Journal of Vacuum Science & Technology B;2023-01-01

4. Micro-pinch formation and extreme ultraviolet emission of laser-induced discharge plasma*;Chinese Physics B;2021-09-01

5. On the Opportunity of Liquid Metal Rotated Anode for High Brightness X-Ray Source;IEEE Transactions on Plasma Science;2021-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3