Potential formation near negative charge collecting substrate in negative ion plasma
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/33/i=21/a=317/pdf
Reference22 articles.
1. Continuum modeling of radio‐frequency glow discharges. I. Theory and results for electropositive and electronegative gases
2. Exact Solution of the Collisionless Plasma-Sheath Equation
3. Observation of Potential Relaxation Instability in a Bounded Discharge Plasma
4. V-Shaped Double Layers Formed by Ion Beam Reflection
5. Steady‐state ion pumping of a potential dip near an electron collecting anode
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1. Discharge characteristics of electronegative Mg–CF4 direct current magnetron sputtering by probe measurements;Journal of Applied Physics;2021-06-21
2. Negative Ion Plasmas;Encyclopedia of Plasma Technology;2016-12-12
3. Status and challenges in electrical diagnostics of processing plasmas;Surface and Coatings Technology;2014-12
4. Negative plasma potential in unmagnetized DC electropositive plasma with conducting walls;Physics Letters A;2011-05
5. Influence of surface condition in Langmuir probe measurements;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-05
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