Influence of hydrogen addition to an Ar plasma on the structural properties of TiO2−xthin films deposited by RF sputtering
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference58 articles.
1. Photoelectrochemical cells
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3. Detection mechanism of TiO2-based ceramic H2 sensors
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5. Moisture Permeation through Ultrathin TiO$_{2}$ Films Grown by Atomic Layer Deposition
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