Thickness profiles of thin films caused by secondary reactions in flow-type atomic layer deposition reactors
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/30/i=12/a=006/pdf
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1. Growth of titanium dioxide thin films by atomic layer epitaxy
2. Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy
3. Growth of In2 O 3 Thin Films by Atomic Layer Epitaxy
4. Atomic layer epitaxy growth of titanium dioxide thin films from titanium ethoxide
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