Charging Effect in Plasma Etching Mask of Hole Array
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/1009-0630/15/i=6/a=15/pdf
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1. Specialized design for three basic mask patterns counteract charging effects during plasma etching;Physics of Plasmas;2024-02-01
2. EFFECTS OF EDGE ROUGHNESS ON SURFACE CHARGING IN PLASMA ETCHING;Surface Review and Letters;2023-08-26
3. The Influence of Secondary Electron Emission on Surface Charging on a Mask Trench in Plasma Etching;Moscow University Physics Bulletin;2022-12
4. The features of surface charging on rectangle mask holes in plasma etching;Physics of Plasmas;2022-10
5. Charging Effect in Basic and Complex Mask Patterns During Plasma Etching;Plasma Chemistry and Plasma Processing;2022-08-03
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