Thin-film growth behavior of non-planar vanadium oxide phthalocyanine*

Abstract

The thin film properties of organic semiconductors are very important to the device performance. Herein, non-planar vanadyl phthalocyanine (VOPc) thin films grown on rigid substrates of indium tin oxide, silicon dioxide, and flexible substrate of kapton by organic molecular beam deposition under vacuum conditions are systematically studied via atomic force microscopy and x-ray diffraction. The results clearly reveal that the morphology and grain size are strongly dependent on the substrate temperature during the process of film deposition. Meanwhile, the VOPc films with the structure of phase I or phase II can be modulated via in situ annealing and post-annealing temperature. Furthermore, the crystalline structure and molecular orientation of vapor-deposited VOPc can be controlled using molecular template layer 3, 4, 9, 10-perylene-tetracarboxylic dianhydride (PTCDA), the VOPc film of which exhibits the phase I structure. The deep understanding of growth mechanism of non-planar VOPc film provides valuable information for controlling structure-property relationship and accelerates the application in electronic and optoelectronic devices.