Electron impact cross-sections and rate coefficients of Si+2 ions relevant to collisional radiative modeling of silicon plasma

Abstract

Abstract We report on the fine structure resolved electron impact excitation (EIE) cross-sections of Si+2 from its ground state 3s 2 (J= 0) to the 41 excited fine structure levels of the configurations 3s3p, 3p 2, 3s3d, 3s4s, 3s4p, 3s5s, 3s4d, 3s4f, 3s5p, 3s5d and 3s5f using relativistic distorted wave theory. The excitation cross-sections from the excited metastable levels (3P0,3P2) of the configuration 3s3p to higher excited levels as well as for some other dominant transitions relevant to plasma modeling are also obtained. In addition, the ionization cross-sections are evaluated from the ground and metastable levels to higher ionized state Si+3 (2S1/2). The calculated cross-sections are utilized to obtain the rate coefficients corresponding to EIE and ionization processes affecting the intensity of prominent Si+2 emission lines 379.61, 380.65, 456.78, and 457.48 nm recorded through optical emission spectroscopic measurements by Wang et al (2020 Phys. Plasmas 27 063513) on laser produced silicon plasma. Further, the rate coefficients corresponding to radiative, and three body recombination are also presented. The reported cross-sections and rate coefficients will be useful for developing rigorous collisional radiative model for the diagnostics of silicon plasma.