Electron interactions with tetramethylsilane from the ionization threshold up to 5000 eV
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
https://iopscience.iop.org/article/10.1088/1361-6595/ac12c2/pdf
Reference71 articles.
1. Promotion of resin bonding to dental zirconia ceramic using plasma deposition of tetramethylsilane and benzene
2. Dissociation of tetramethylsilane for the growth of SiC nanocrystals by atmospheric pressure microplasma
3. Characterization of Carbon-Doped SiO[sub 2] Low k Thin Films: Preparation by Plasma-Enhanced Chemical Vapor Deposition from Tetramethylsilane
4. Sequential deposition of hexamethyldisiloxane and benzene in non-thermal plasma adhesion to dental ceramic
5. Focused Electron Beam Induced Deposition of Si-Based Materials From SiOxCy to Stoichiometric SiO2: Chemical Compositions, Chemical-Etch Rates, and Deep Ultraviolet Optical Transmissions
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