The damage property of oxyfluoride glasses irradiated by a 351 nm high fluence laser-Reference-Cited by-同舟云学术

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The damage property of oxyfluoride glasses irradiated by a 351 nm high fluence laser

Published:2013-06-10 Issue:7 Volume:23 Page:076005
ISSN:1054-660X
Container-title:Laser Physics
language:
Short-container-title:Laser Phys.

Author:

Hou Chaoqi,Li Weinan,Wang Pengfei,Guo Haitao,Gao Fei,Cui Xiaoxia,Lu Min,Peng Bo

Publisher

IOP Publishing

Subject

Industrial and Manufacturing Engineering,Condensed Matter Physics,Instrumentation,Atomic and Molecular Physics, and Optics

Link

http://stacks.iop.org/1555-6611/23/i=7/a=076005/pdf

Reference19 articles.

1. Metallic-like photoluminescence and absorption in fused silica surface flaws

2. Defects induced in fused silica by high fluence ultraviolet laser pulses at 355 nm

3. Laser damage growth in fused silica with simultaneous 351nm and 1053nm irradiation

4. Laser damage precursors in fused silica

5. Influence of subsurface cracks on laser-induced surface damage

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fundamental-frequency-absorbed oxyfluoride glass in a high-power laser;Applied Optics;2016-03-28

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