Abstract
Abstract
The past decade has seen significant growth in the field of thin film lithium niobate electro-optic modulators, which promise reduced voltage requirements and higher modulation bandwidths on a potentially integrated platform. This article discusses the state-of-the-art in thin film modulator technology and presents a simplified simulation technique for quickly optimizing a hybrid silicon- or silicon nitride-lithium niobate modulator. Also discussed are the feasibility of creating a 1 V half-wave voltage, 100 GHz bandwidth modulator, and the design specifications for a single hybrid silicon-lithium niobate platform optimized to operate across all telecommunication bands (between 1260 and 1675 nm wavelengths).
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
33 articles.
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