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Effect of using stencil masks made by focused ion beam milling on permalloy (Ni81Fe19) nanostructures

  • Published:2013-02-28 Issue:11 Volume:24 Page:115301
  • ISSN:0957-4484
  • Container-title:Nanotechnology
  • language:
  • Short-container-title:Nanotechnology

Author:

Bates J R,Miyahara Y,Burgess J A J,Iglesias-Freire Ó,Grütter P

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy;Electronics;2023-05-08

2. Assembling Magnetic Nanoparticles on Nanomechanical Resonators for Torque Magnetometry;International Journal of Molecular Sciences;2020-02-02

3. Resistless nanofabrication by stencil lithography: A review;Microelectronic Engineering;2015-01

4. Epitaxial patterning of thin-films: conventional lithographies and beyond;Journal of Micromechanics and Microengineering;2014-07-31

5. Stiction-free fabrication of lithographic nanostructures on resist-supported nanomechanical resonators;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-09
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