Semiconductor applications of plasma immersion ion implantation
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Nuclear Energy and Engineering
Link
http://stacks.iop.org/0741-3335/45/i=5/a=304/pdf
Reference58 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Plasma-Immersion Ion Implantation
3. Plasma immersion ion implantation—a fledgling technique for semiconductor processing
4. New doping method for subhalf micron trench sidewalls by using an electron cyclotron resonance plasma
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