GISAXS and ATR-FTIR Studies on Stress-Induced Microstructure Evolution of a-Si:H under H 2 Plasma Exposure
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/29/10/106801/pdf
Reference31 articles.
1. Investigation of the a-Si:H films by using thermal and light-induced annealing treatment in atomic hydrogen atmosphere in H-W-ECR CVD system
2. Mechanism of hydrogen-induced crystallization of amorphous silicon
3. Hydrogen diffusion and induced-crystallization in intrinsic and doped hydrogenated amorphous silicon films
4. Passivation, structural modification, and etching of amorphous silicon in hydrogen plasmas
5. Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline silicon
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