Nanomorph Silicon Thin Films Prepared by Using an HW-MWECR CVD System-Reference-Cited by-同舟云学术

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Nanomorph Silicon Thin Films Prepared by Using an HW-MWECR CVD System

Published:2005-04-14 Issue:5 Volume:22 Page:1260-1263
ISSN:0256-307X
Container-title:Chinese Physics Letters
language:
Short-container-title:Chinese Phys. Lett.

Author:

Yue-Hui Hu,Guang-Hua Chen,Jian-Er Zhou,Yan-Dong Rong,Ying Li,Xue-Mei Song,Wen-Li Zhang,Yi Ding,Zhuo Gao,Zhan-Jie Ma,Huai-En Zhou,Xiu-Hong Zhu

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Reference12 articles.

1. Structure and physical properties of paracrystalline atomistic models of amorphous silicon

2. Onset of microcrystallinity in silicon thin films

3. Fast Growth of Polycrystalline Film in SiCl 4 /H 2 Plasma

4. Incorporation of p-type microcrystalline silicon films in amorphous silicon based solar cells in a superstrate structure

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation of hydrogenated microcrystalline silicon films with hot-wire-assisted MWECR-CVD system;Chinese Physics;2006-04

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