Development and Characterization of Metal-Insulator-Metal Capacitors with SiN x Thin Films by Plasma-Enhanced Chemical Vapor Deposition
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/27/7/078101/pdf
Reference21 articles.
1. Compact Harmonic Filter Design and Fabrication Using IPD Technology
2. High-performance integrated passive technology by advanced SI-GaAs-based fabrication for RF and microwave applications
3. Effects of Si3N4, SiO, and polyimide surface passivations on GaAs MESFET amplifier RF stability
4. A Novel Fully Depleted Air AlN Silicon-on-Insulator Metal-Oxide-Semiconductor Field Effect Transistor
5. Characteristics Analysis of Vertical Double Gate Strained Channel Heterostructure Metal-Oxide-Semiconductor-Field-Effect-Transistor
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