Recent progress in direct exposure of interconnects on PCBs

Author:

Barbucha Robert,Mizeraczyk Jerzy

Abstract

Purpose – This paper aims to use a survey of techniques to present the patterning of electric circuitry on printed circuit boards (PCBs). Second, a proposal of a new technology for direct exposure of interconnects on PCBs, using a digital micromirror device (DMD) is presented. Design/methodology/approach – In this proposal, the DMD chip was incorporated into a prototype system for exposure of soldermask pattern for a mass scale production. As a light source, 52 semiconductor UV lasers were combined together to deliver UV powerful beam onto the DMD chip area. Findings – A laser beam power of around 9 W was achieved from a single exposure head. With five exposure heads installed into a single machine, it is possible to expose 1,400 PCB panels per day. Such a production rate from a single exposure machine satisfies the demands of biggest PCB factories. Research limitations/implications – The Gaussian energy distribution of the laser beam from the 52-lasers head on the PCB surface was experimentally found. Because the exposure image needs to be highly uniform, this made a problem when the printed circuitry quality is considered. This problem was solved by using a software algorithm. Practical implications – The use of UV lasers exposure heads brings economical advantages over conventional bulb UV lamps. The power consumption drops down ten times for lasers source. Social implications – Because the exposure processing can be made with lower electric costs and higher yield, it will make the PCBs cheaper. Originality/value – At present, the idea of collecting a great number of lasers as a UV source for exposure head is attractive solution.

Publisher

Emerald

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering

Reference10 articles.

1. Barbucha, R. , Kocik, M. and Mizeraczyk, J. (2008), “Laser direct imaging system for high density interconnects on PCB”, Electrical Review , Vol. 84 No. 3, pp. 54-56.

2. Barbucha, R. , Kocik, M. , Mizeraczyk, J. , Kozioł, G. and Borecki, J. (2006), “Laser direct imaging of tracks on PCB covered with laser photoresist”, Bulletin of the Polish Academy of Sciences, Technical Sciences , Vol. 56 No. 1, pp. 17-20.

3. Barclay, B. and Morrell, M. (2001), “Laser direct imaging – a user perspective”, Leiterplatten Magazine , Vols 7/8, pp. 1-11.

4. Bruning, J. (1997), “Optical lithography – thirty years and three orders of magnitude”, SPIE Proceeding , Vol. 3051, pp. 14-27.

5. Dlugan, A. , MacAulay, C.E. and Lane, P.M. (2000), “Improvements to quantitative microscopy through the use of digital micromirror devices”, SPIE Proceedings , Vol. 3221, pp. 6-11.

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3