Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology
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Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Reference36 articles.
1. Tin, T. C., et al. A realizable overlay virtual metrology system in semiconductor manufacturing: Proposal, challenges and future perspective. IEEE Access 9, 65418-65439 (2021).
2. den Boef, A. J. Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing. Surface Topography: Metrology and Properties 4, 023001 (2016).
3. Leray, P. et al. Diffraction based overlay metrology: accuracy and performance on front end stack. In Proceedings of SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXⅡ. San Jose, California, United States (SPIE, 2008).
4. Yang, W. D. et al. Novel diffraction-based spectroscopic method for overlay metrology. In Proceedings of SPIE 5083, Metrology, Inspection, and Process Control for Microlithography XVⅡ, Santa Clara, California, United States, 200–207 (SPIE, 2003).
5. Adel, M. et al. Diffraction order control in overlay metrology: a review of the roadmap options. In Proceedings of SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXⅡ, San Jose, California, United States, 23 – 41 (SPIE, 2008).
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