Influence of Material Properties of PECVD Silicon Nitride Films Prepared at 150℃ from Highly Diluted SiH4 in N2
-
Published:2013-03-05
Issue:3
Volume:51
Page:233-238
-
ISSN:1738-8228
-
Container-title:Korean Journal of Metals and Materials
-
language:
-
Short-container-title:Korean J. Met. Mater.
Author:
Hong Wan-Shick,No Kil-Sun,Keum Di-Su
Publisher
The Korean Institute of Metals and Materials
Subject
Metals and Alloys,Surfaces, Coatings and Films,Modeling and Simulation,Electronic, Optical and Magnetic Materials