Rapid Thermal Annealing Effects on the Electrical and Structural Properties of ITO Thin Films Deposited at Room Temperature-Reference-Cited by-同舟云学术

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Rapid Thermal Annealing Effects on the Electrical and Structural Properties of ITO Thin Films Deposited at Room Temperature

Published:2013-09-05 Issue:9 Volume:51 Page:691-699
ISSN:1738-8228
Container-title:Korean Journal of Metals and Materials
language:
Short-container-title:Korean J. Met. Mater.

Author:

Choi Se-Young,Kim Sung Jin,Choi Kyoon

Publisher

The Korean Institute of Metals and Materials

Subject

Metals and Alloys,Surfaces, Coatings and Films,Modelling and Simulation,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Solution-Processed Multistacked Tin-Doped Indium Oxide Nanoparticle Conductors for Cost-Effective Thin Film Heaters;ACS Applied Electronic Materials;2021-06-17

2. Finite element analysis of compressive behavior of hybrid short fiber/particle/mg metal matrix composites using RVE model;Metals and Materials International;2015-03

3. Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method;Korean Journal of Metals and Materials;2014-12-05

4. Effect of Microstructure on Dewetting Evolution in Polycrystalline Au Thin Film;Korean Journal of Metals and Materials;2014-12-05

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