Formation of Functional Oxide Thin Film by Plasma-assisted Reactive Process Using Mist
Author:
Affiliation:
1. Joining and Welding Research Institute, Osaka University
Publisher
Sumart Processing Society for Minerals, Environment and Energy
Subject
Industrial and Manufacturing Engineering,Surfaces, Coatings and Films
Link
https://www.jstage.jst.go.jp/article/jspmee/10/1/10_10/_pdf
Reference21 articles.
1. K. Iwata, P. Fons, A. Yamada, K. Matsubara. S. Niki, K. Nakahara and H. Takasu: “ZnO Films Grown on Si Substrate by Radical Source MBE”, Trans. IEE-J. 122-E（2）,（2002）, 110-115.
2. Y. M. Chung, C. S. Moon, W. S. Jung and J. G. Han: “The low temperature synthesis of Al doped ZnO films on glass and polymer using pulsed co-magnetron sputtering: H2 effect”, Thin Solid Films 515（2006）, 567-570.
3. K. Sivaramakrishnan, N. D. Theodore, J. F. Moulder and T. L. Alford: “The role of copper in ZnO/Cu/ZnO thin films for flexible electronics “J. Appl. Phys. 106（2009）, 063510.
4. S. Logothetidis, A. Laskarakis, S. Kassavetis, S. Lousinian, C. Gravalidis and G. Kiriakidis: “Optical and structural properties of ZnO for transparent electronics”, Thin Solid Films 516（2008）, 1345-1349.
5. A. Bowen, J. Li, J. Lewis, K. Sivaramakrishnan, T. L. Alford and S. Iyer: “The properties of radio frequency sputtered transparent and conducting ZnO:F films on polyethylene naphthalate substrate”, Thin Solid Films 519（2011）, 1809-1816.
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