Structure and Properties of Ta–Si–N Coatings Produced by Pulsed Magnetron Sputtering
Author:
Publisher
Allerton Press
Subject
Metals and Alloys,Surfaces, Coatings and Films,Mechanics of Materials
Link
https://link.springer.com/content/pdf/10.3103/S1067821221050151.pdf
Reference36 articles.
1. Nicolet, M.-A., Ternary amorphous metallic thin films as diffusion barriers for Cu metallization, Appl. Surf. Sci., 1995, vol. 91, pp. 269–276.
2. Advanced barriers for copper interconnects;M. Hecker,2005
3. Chung, C.K. and Chen, T.S., Effect of Si/Ta and nitrogen ratios on the thermal stability of Ta–Si–N thin films, Microelectron. Eng., 2010, vol. 87, pp. 129–134.
4. Olowolafe, J.O., Rau, I., Unruh, K.M., Swann, C.P., Jawad, Z.S., and Alford, T., Effect of composition on thermal stability and electrical resistivity of Ta–Si–N films, Thin Solid Films, 2000, vol. 365, pp. 19–21.
5. Zeman, P., Musil, J., and Daniel, R., High-temperature oxidation resistance of Ta-Si-N films with a high Si content, Surf. Coat. Technol., 2006, vol. 200, pp. 4091–4096.
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