In situ regulation of microstructure and microwave-absorbing properties of FeSiAl through HNO3 oxidation

Author:

Guo Yang1,Zhang Liwen1,Lu Haipeng2,Jian Xian3

Affiliation:

1. School of Electrical and Information Engineering, University of Panzhihua , Panzhihua 617000 , China

2. National Engineering Researching Centre of Electromagnetic Radiation Control Materials, Key Laboratory of Multi-Spectral Absorbing Materials and Structures of Ministry of Education, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China , Chengdu , 610054 , China

3. Delta Region Institute (Huzhou), University of Electronic Science and Technology of China , Huzhou , 313001 , China

Abstract

Abstract Wrapping insulation of coatings is effective for enhancing the microwave-absorbing properties (MAPs) of ferromagnetic absorbents (FMAs). However, the process is still limited by the low bonding strength with the matrix. Herein, an in situ regulation strategy based on the preparation of thin thickness and strong adhesion insulating layers through HNO3 oxidation was developed to address the limitations. The oxidation process of FeSiAl (FSA) powders was carried out by HNO3 following three main steps. First, the original oxide layer first reacted with HNO3 to form Fe3+ and Al3+. Second, the oxide layer composed of Al2O3 and Fe3O4 was preferentially formed due to the negative change in Gibbs free energy. Finally, the oxide and pigment-deposition layers were subjected to competitive growth and dissolution accompanied by the dissolution of Fe and Al atoms. Oxidation time up to 10 min resulted in the formation of a bilayer structure with a thickness of ∼50 nm on the FSA surface, as well as an outer layer crammed of Al(OH)3 and Fe(OH)3, and an inner layer containing mixed Fe2O3, Fe3O4, Al2O3, and SiO2. The MAPs of as-treated FSA achieved minimum reflection loss (RL) of −25.90 dB at 13.36 GHz, as well as absorption bandwidth of 5.61 GHz (RL < −10 dB) at 10.13–15.74 GHz and thickness of 2.5 mm. In sum, the developed route looks promising for the preparation of high-performance FMAs.

Publisher

Walter de Gruyter GmbH

Subject

Surfaces, Coatings and Films,Process Chemistry and Technology,Energy Engineering and Power Technology,Biomaterials,Medicine (miscellaneous),Biotechnology

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