Polyhedral oligomeric silsesquioxane (POSS)-modified phenolic resin: Synthesis and anti-oxidation properties

Author:

Wang Bing1,Shi Minxian1,Ding Jie1,Huang Zhixiong1

Affiliation:

1. School of Materials Science and Engineering, Wuhan University of Technology , Wuhan 430070 , China

Abstract

Abstract In this work, octamercapto polyhedral oligomeric silsesquioxane (POSS-8SH) and octaphenol polyhedral oligomeric silsesquioxane (POSS-8Phenol) were successfully synthetized. POSS-8Phenol was added into the synthesis process of liquid thermoset phenolic resin (PR) to obtain POSS-modified phenolic resin (POSS-PR). Chemical structures of POSS-8SH, POSS-8Phenol, and POSS-PR were confirmed by FTIR and 1H-NMR. TG and DTG analysis under different atmosphere showed that char yield of POSS-PR at 1,000°C increased from 58.6% to 65.2% in N2, which in air increased from 2.3% to 26.9% at 700°C. The maximum pyrolysis temperature in air increased from 543°C to 680°C, which meant better anti-oxidation properties. XRD results confirmed both POSS-8Phenol and POSS-PR-generated crystalline SiO2 in air, which could explain the improvement of anti-oxidation properties. SEM showed that the POSS-PR had phase separation during curing process. Finally, carbon fiber fabric-reinforced POSS-PR (C-POSS-PR) was prepared to verify the anti-oxidation properties of POSS-PR.

Publisher

Walter de Gruyter GmbH

Subject

Polymers and Plastics,Physical and Theoretical Chemistry,General Chemical Engineering

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