Electrical Properties of Dielectric and Ferroelectric Films Prepared by Plasma Enhanced Atomic Layer Deposition-Reference-Cited by-同舟云学术

Electrical Properties of Dielectric and Ferroelectric Films Prepared by Plasma Enhanced Atomic Layer Deposition

Published:2002-01 Issue:1 Volume:46 Page:275-284
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Lee Won-Jae¹,Shin Woong-Chul²,Chae Byung-Gyu²,Ryu Sang-Ouk²,You In-Kyu²,Cho Seong Mok²,Yu Byoung-Gon²,Shin Byoung-Chul¹

Affiliation:

1. b Research Center for Electronic Ceramics, Dept. of Advanced Materials , Eng. Dong-Eui University , Busan , Korea

2. a Basic Research Lab. , ETRI , 161 Kajong-dong, Yusong-gu, Daejon , 305-600

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/713718252

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