Piezoelectric Aluminum Nitride Films Deposited by Triode Sputtering for Surface Acoustic Wave Devices
Author:
Affiliation:
1. a LPMIA , Université H. Poincaré - Nancy I , Vandoeuvre , F-54506
2. b IMO , Limburgs Universitair Centrum , Diepenbeek , B-3590
3. c LAMAC - Z.I. champ de l'Abbesse , Maubeuge , F-59600
4. d LABOMAP - ENSAM , Cluny , F-71250
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/00150190211764
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge;Journal of Vacuum Science & Technology A;2023-09-26
2. Textured hexagonal and cubic phases of AlN films deposited on Si (100) by DC magnetron sputtering and high power impulse magnetron sputtering;Thin Solid Films;2018-06
3. Fabrication of AlN Films by RF Magnetron Sputtering for Surface Acoustic Wave Applications;Ferroelectrics;2014-01-03
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