The application of high resolution rutherford backscattering to the measurement of ion ranges in Si and Al
Author:
Affiliation:
1. a Department of Electrical Engineering , University of Salford , Salford , M5 4WT , Lancashire , U.K.
Publisher
Informa UK Limited
Subject
General Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/00337577508242056
Reference10 articles.
1. Ion Implantation
2. Metallurgical applications of ion implantation and ion bombardment
3. Applications of Ion Beams to Metals
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