Cascade and quasi thermal processes in excited atom sputtering
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337577808240838
Reference45 articles.
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1. The angle of incidence dependence of ion-bombardment induced photon emission from solids;Surface Science;1984-01
2. Sputter Depth Profiling of Microelectronic Structures;Journal of The Electrochemical Society;1983-05-01
3. The energy spectra of the secondary ion emission for transition metals of the fourth period;Vacuum;1983-03
4. Investigation of Glasses Using Surface Profiling by Spectrochemical Analysis of Sputter-Induced Radiation: I, Surface Profiling Technique with High In-Depth Resolution;Journal of the American Ceramic Society;1982-11
5. Ion beam mixing in amorphous silicon II. Theoretical interpretation;Nuclear Instruments and Methods;1981-04
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