Interface growth mechanism in ion beam sputtering-deposited Mo/Si multilayers
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics
Link
http://www.tandfonline.com/doi/pdf/10.1080/14786430600640502
Reference16 articles.
1. Reduction of defect density on blanks: application to the extreme ultraviolet lithography
2. Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors
3. Interfacial reactions and thermal stability of ultrahigh vacuum deposited multilayered Mo/Si structures
4. Crystalline silicon films sputtered on molybdenum
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2. Process optimization for performance improvement in Mo/Si multilayers for EUV mask blanks;Extreme Ultraviolet Lithography 2020;2020-10-15
3. Interface studies of Mo/Si multilayers with carbon diffusion barrier by grazing incidence extended X-ray absorption fine structure;Thin Solid Films;2019-03
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