Hydrogen-plasma etching of hydrogenated amorphous silicon: a study by a combination of spectroscopic ellipsometry and trap-limited diffusion model
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics
Link
http://www.tandfonline.com/doi/pdf/10.1080/14786430310001635440
Reference52 articles.
1. Abstraction of atomic hydrogen by atomic deuterium from an amorphous hydrogenated silicon surface
2. Chemical equilibration of plasma-deposited amorphous silicon with thermally generated atomic hydrogen
3. Dielectric properties of heavily doped crystalline and amorphous silicon from 1.5 to 6.0 eV
4. Azzam RM Bashara NM 1997Ellipsometry and Polarized LightAmsterdam North-Holland p. 274
5. Determination of the hydrogen diffusion coefficient in hydrogenated amorphous silicon from hydrogen effusion experiments
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