Compositional and structural properties of deuterated plasma enhanced chemical vapour deposited silicon-carbon alloys

Author:

Calcagno L.1,Giorgis F.2,Makthari A.3,Musumeci P.1,Pirri F.2

Affiliation:

1. a Dipartimento di Fisica and Istituto Nazionale di Fisica per la Materia , Corso Italia 57, Catania , Italy

2. b Dipartimento di Fisica and Istituto Nazionale di Fisica per la Materia , Politecnico di Torino , Via Duca degli Abruzzi, Torino , Italy

3. c Département de Physique, Faculté des Sciences , Université Moulay Ismail , BP 4010, Beni M'Hamed, Meknès , Morocco

Publisher

Informa UK Limited

Subject

General Physics and Astronomy,General Chemical Engineering

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. New insight into the microstructure and doping of unintentionally n-type microcrystalline silicon carbide;Journal of Applied Physics;2016-05-07

2. Characterization of hydrogenated and deuterated silicon carbide films codeposited by magnetron sputtering;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2016-03

3. Topological modeling of amorphization in SiC nodal network structures using local rules;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-08

4. Adjustable hydrogen atom incorporation into sputter deposited a-SiC;Thin Solid Films;2006-10

5. Characterization of SiC Thin Film Obtained by Magnetron Reactive Sputtering: IBA, IR and Raman Studies;Materials Science Forum;2005-05

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