Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors-Reference-Cited by-同舟云学术

Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors

Published:1997-09 Issue:1-4 Volume:17 Page:187-195
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Cha Seon Young¹,Jang Byung-Tak¹,Kwak Dong-Hwa¹,Shin Chang Ho¹,Lee Hee Chul¹

Affiliation:

1. a Department of Electrical Engineering , Korea Advanced Institute of Science and Technology , 373-1, Kusong-dong, Yusong-gu, Taejon, 305–701, Korea

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10584589708012993

Reference6 articles.

1. Platinum Bottom Electrodes Formed by Electron-Beam Evaporation for High-Dielectric Thin Films

2. Electrical Comparison of Sol-Gel Derived Lead-Zirconate-Titanate Capacitors with Ir and Pt Electrodes

3. Integration technology of ferroelectrics and the performance of the integrated ferroelectrics

4. Effects of anneal ambients and Pt thickness on Pt/Ti and Pt/Ti/TiN interfacial reactions

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