A High-precision Adaptation of the 'Turning-point' Method of Monitoring the Optical Thickness of Dielectric Layers Using Microprocessors
Author:
Affiliation:
1. a Department of Pure and Applied Physics, The Queen's University of Belfast, Belfast BT7 1NN, Northern Ireland
Publisher
Informa UK Limited
Subject
Electronic, Optical and Magnetic Materials
Link
https://www.tandfonline.com/doi/pdf/10.1080/713820821
Reference9 articles.
1. Optical applications of dielectric thin films
2. Contribution à l'étude de l'intensité des raies et bandes d'absorption dans l'infrarouge
3. Improved Methods for Producing Interference Filters
4. Sources of error in the modulated wavelength optical thickness monitor for dielectric layers
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1. Thickness monitoring method of infrared optical thin film irregular coatings;Fourth International Conference on Thin Film Physics and Applications;2000-11-29
2. Deposition error compensation for optical multilayer coatings I Theoretical description;Applied Optics;1992-07-01
3. Reflection filter multilayers of metallic and dielectric thin films;Applied Optics;1989-07-15
4. Thermal and Structural Constants of Magnesium Fluoride and Zinc Sulphide for Optical Coating Applications;Optica Acta: International Journal of Optics;1986-07
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