Effect of plasma carrier gas on the moisture barrier properties of plasma-enhanced chemical vapor deposited (PECVD) polyorganosiloxane thin film
Author:
Affiliation:
1. School of Chemical Engineering, Sungkyunkwan University, Suwon, Republic of Korea
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
https://www.tandfonline.com/doi/pdf/10.1080/15421406.2020.1743431
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3. Processing characteristics, structure development, and properties of uni and biaxially stretched poly(ethylene 2,6 naphthalate) (PEN) films
4. Elastic modulus of the crystalline regions of poly(ethylene-2,6-naphthalate)
5. Surface modification of poly(ethylene-2,6-naphthalate) using NH3 plasma
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