Topographical changes induced by low energy ion beam sputtering at oblique incidence
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337578308228185
Reference10 articles.
1. Sputtering—Surface changes induced by ion bombardment
2. Analytical modelling of sputter induced surface morphology
3. Theoretical assessments of major physical processes involved in the depth resolution in sputter profiling
4. The effect of incidence angle on ion bombardment induced surface topography development on single crystal copper
5. Development of the surface topography on silica glass due to ion-bombardment
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