Build-up and annealing of damage produced by low-energy argon ions at Si(lll) surface
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337578708225342
Reference22 articles.
1. Modifications des caractéristiques électriques de contacts métal-silicium par bombardement d'ions argon de faible énergie
2. Dependence of low energy ion beam exposure effects in silicon on ion species, exposure history, and material properties
3. Ion‐bombardment‐induced changes in the electronic structure of silicon surfaces
4. Local Atomic Structure of a Clean Surface by Surface Extended X-Ray Absorption Fine Structure: Amorphized Si
5. The interpretation of ellipsometric measurements of ion bombardment of noble gases on semiconductor surfaces
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A graphite enclosure assisted synthesis of high-quality patterned graphene on 6H–SiC by ion implantation;Carbon;2021-02
2. Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment;Materials;2010-10-22
3. Transmission Electron Microscope Observations of Si/Si Interface Bonded at Room Temperature by Ar Beam Surface Activation;Japanese Journal of Applied Physics;1999-03-15
4. Critical energy densities for amorphization in Ar-ion implanted silicon at low energies;Physics Letters A;1997-03
5. Damage profiling of Ar+ sputtered Si(100) surface by medium energy ion scattering spectroscopy;Applied Surface Science;1996-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3