Applications of molecular dynamics methods to low energy ion beams and film deposition processes
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,Nuclear and High Energy Physics,Radiation
Link
http://www.tandfonline.com/doi/pdf/10.1080/10420159408219794
Reference43 articles.
1. Kinetics of dopant incorporation using a low-energy antimony ion beam during growth of Si(100) films by molecular-beam epitaxy
2. Strain modification by ion-assisted molecular beam epitaxy in the SixGe1−x alloy system: a kinetic analysis
3. Suppression of three-dimensional island nucleation during GaAs growth on Si(100)
4. Atomic-Scale Simulation in Materials Science
5. Developing potentials for atomistic simulations
Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Structure and mobility on amorphous silicon surfaces;Surface Science;2004-02
2. Characteristics of surface and film morphology in the IBAD deposition process: a Monte Carlo simulation study;Vacuum;2003-03
3. Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties;Journal of Physics D: Applied Physics;2000-02-08
4. Hyperthermal vapor deposition of copper: reflection and resputtering effects;Surface Science;1999-07
5. Hyperthermal vapor deposition of copper: athermal and biased diffusion effects;Surface Science;1999-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3