Stacking faults in intrinsic and N-doped 4H–SiC: true influence of the N-doping on their multiplicity
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics
Link
http://www.tandfonline.com/doi/pdf/10.1080/14786435.2012.745018
Reference17 articles.
1. Degradation of hexagonal silicon-carbide-based bipolar devices
2. Stacking fault band structure in 4H–SiC and its impact on electronic devices
3. Structural instability of 4H–SiC polytype induced by n-type doping
4. Generation of Stacking Faults in Highly Doped n-Type 4H-SiC Substrates
5. Stacking faults in heavily nitrogen doped 4H-SiC
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1. Kink Migration along 30° Si‐Core Partial Dislocations in 4H‐SiC;physica status solidi (a);2022-04-21
2. Cathodoluminescence and EBIC investigations of stacking fault expansion in 4H-SiC due to e-beam irradiation at fixed points;Journal of Physics D: Applied Physics;2022-03-24
3. Low temperature stacking fault nucleation and expansion from stress concentrators in 4H-SiC;Acta Materialia;2017-10
4. Investigation of stacking faults introduced into 4H-SiC crystals by indentation;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2017-01
5. Effect of low energy electron beam irradiation on Shockley partial dislocations bounding stacking faults introduced by plastic deformation in 4H-SiC in its brittle temperature range;Superlattices and Microstructures;2016-11
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