A model-based clustering approach to the recognition of the spatial defect patterns produced during semiconductor fabrication
Author:
Affiliation:
1. a Department of Industrial and Information Engineering , The University of Tennessee, Knoxville , Knoxville , TN , 37996 , USA
Publisher
Informa UK Limited
Subject
Industrial and Manufacturing Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/07408170701592556
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