Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Cited by
4 articles.
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1. Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-22
2. Impact of parallelism on data volumes for a multibeam mask writer;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
3. Lossless layout image compression algorithms for electron-beam direct-write lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11
4. Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-08-11