Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
Author:
Affiliation:
1. IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
2. Institute of Micro and Sensor Systems, Otto-von-Guericke University, Universitätsplatz 2, 39106 Magdeburg, Germany
Funder
EFRE
Investment Bank Berlin
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4936221
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