Thermal stability of HVPE-grown (0001) α-Ga2O3 on sapphire template under vacuum and atmospheric environments

Author:

Wen Zhuoqun1ORCID,Khan Kamruzzaman1ORCID,Sun Kai1ORCID,Wellen Ruby2,Oshima Yuichi3ORCID,Ahmadi Elaheh24ORCID

Affiliation:

1. Department of Materials Science and Engineering, University of Michigan 1 , Ann Arbor, Michigan 48109

2. Department of Electrical Engineering and Computer Science, University of Michigan 2 , Ann Arbor, Michigan 48109

3. Optical Single Crystals Group, National Institute for Materials Science 3 , Tsukuba 3050044, Japan

4. Applied Physics Program, University of Michigan 4 , Ann Arbor, Michigan 48109

Abstract

In the present study, thermal stability of α-Ga2O3 under vacuum and ambient pressure conditions was investigated in situ by x-ray diffraction and transmission electron microscopy (TEM). It was observed that the thermal stability of α-Ga2O3 increased by 200 °C when pressure was lowered from an atmospheric to a vacuum level. This finding can be explained by oxygen diffusion under different oxygen partial pressures. In addition, in situ TEM imaging revealed that, once past the decomposition temperature, the onset of phase change propagates from the top crystal surface and accumulates strain, eventually resulting in a fractural film. The mechanism of α-Ga2O3 to β-Ga2O3 transition is evaluated through experiments and is discussed in this manuscript.

Funder

Air Force Office of Scientific Research

Center for Hierarchical Manufacturing, National Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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