Radiative substrate heating for high‐Tc superconducting thin‐film deposition: Film‐growth‐induced temperature variation-Reference-Cited by-同舟云学术

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Radiative substrate heating for high‐Tc superconducting thin‐film deposition: Film‐growth‐induced temperature variation

Published:1992-11 Issue:6 Volume:10 Page:3407-3410
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Westerheim A. C.,Choi B. I.,Flik M. I.,Cima M. J.,Slattery R. L.,Anderson Alfredo C.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577792

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Versatile and economical specimen heater for ultrahigh vacuum applications;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-09

2. A new radiative heater for high Tc thin film growth;Review of Scientific Instruments;1998-09

3. Full wafer in situ deposition of thallium lead superconductors;Journal of Superconductivity: Incorporating Novel Magnetism;1998

4. An oxygen-compatible radiant substrate heater for thin film growth at substrate temperatures up to 1050 °C;Review of Scientific Instruments;1997-06

5. Large area double‐sided YBa2Cu3O7−δ films grown by single‐source metal‐organic chemical vapor deposition;Applied Physics Letters;1995-07-31

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