Minimum feature sizes and ion beam profile for a focused ion beam system with post-objective lens retarding and acceleration mode
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Normal-state and superconducting properties of Co-doped BaFe2As2 and MgB2 thin films after focused helium ion beam irradiation;Superconductor Science and Technology;2019-08-01
2. High resolution TEM analysis of focused ion beam amorphized regions in single crystal silicon—A complementary materials analysis of the teardrop method;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-01
3. Current density profile characterization and analysis method for focused ion beam;Microelectronic Engineering;2016-04
4. In Situ Microfabrication and Measurements of Bi2Se3 Ultrathin Films in a Multichamber System with a Focused Ion Beam, Molecular Beam Epitaxy, and Four-Tip Scanning Tunneling Microscope;e-Journal of Surface Science and Nanotechnology;2014
5. Resolution, masking capability and throughput for direct-write, ion implant mask patterning of diamond surfaces using ion beam lithography;Journal of Micromechanics and Microengineering;2012-03-29
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